Title:
APPARATUS FOR MANUFACTURING MASK DEVICE, RECORDING MEDIUM, METHOD FOR MANUFACTURING MASK DEVICE AND MASK DEVICE
Document Type and Number:
Japanese Patent JP2022192018
Kind Code:
A
Abstract:
To provide an apparatus for manufacturing a mask device that can adjust tensile force to a mask precisely, and to provide a manufacturing method.SOLUTION: A mask device may include: a frame 40 including a first side 41 and a second side 42 facing each other in a first direction D1 while interposing an opening 45 therebetween and a third side 43 and a fourth side 44 facing each other in a second direction D2 intersecting the first direction while interposing the opening therebetween; and a mask including ends fixed to the first side and the second side. A manufacturing apparatus 60 may include: a pressing mechanism for pressing the first side and the second side in a direction oriented to the opening; a displacement measuring mechanism for measuring deformation amounts of the first side and the second side in the first direction; and a fixing device 74 for fixing the mask to the first side and the second side. The pressing mechanism may include: five or more pressing devices aligned along the second direction at intervals of 500 mm or less and pressing the first side; and five or more pressing devices aligned along the second direction at intervals of 500 mm or less and pressing the second side.SELECTED DRAWING: Figure 10
Inventors:
OKAMOTO EISUKE
Application Number:
JP2022090445A
Publication Date:
December 28, 2022
Filing Date:
June 02, 2022
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
H01L51/50; C23C14/04; H05B33/10
Attorney, Agent or Firm:
Miyajima Manabu
Yukihiro Hotta
Kazuo Okamura
Yukihiro Hotta
Kazuo Okamura
Previous Patent: Active energy ray-curable composition and cured product
Next Patent: Capacitive communication channel for auxiliary equipment
Next Patent: Capacitive communication channel for auxiliary equipment