Title:
基板エッジを洗浄し、基板キャリアヘッドの間隙を洗浄する、装置及び方法
Document Type and Number:
Japanese Patent JP7442654
Kind Code:
B2
Abstract:
The present disclosure relates to load cups that include an annular substrate station configured to receive a substrate. The annular substrate station surrounds a nebulizer located within the load cup. The nebulizer includes a set of energized fluid nozzles disposed on an upper surface of the nebulizer adjacent to an interface between the annular substrate station and the nebulizer. The set of energized fluid nozzles are configured to release energized fluid at an upward angle relative to the upper surface.
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Inventors:
Lou, Way
Chang, Jimin
Tan, Chienshaw
Brown, Brian J.
Chang, Jimin
Tan, Chienshaw
Brown, Brian J.
Application Number:
JP2022544300A
Publication Date:
March 04, 2024
Filing Date:
October 07, 2021
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/304
Domestic Patent References:
| JP2016043442A | ||||
| JP2018133512A |
Foreign References:
| US20200234995 | ||||
| US20200331113 | ||||
| US7044832 |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation
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