Title:
APPARATUS AND METHOD FOR DEVICE-PROCESSING OF POSITIVE PRESSURE WITH TWO PARTITIONS TO MINIMIZE LEAKAGE
Document Type and Number:
Japanese Patent JP2002253645
Kind Code:
A
Abstract:
To provide a method and an apparatus for effectively flowing a fluid in a device having a lumen during cleaning, disinfecting or sterilizing.
The apparatus for device-processing of a positive pressure with two partitions to minimize a leakage comprises two boundary regions and two fluid supply sources. The method for device-processing comprises the step of flowing the fluid into the two adjacent compartments. Thus, the loss of the fluid due to a gap can be reduced or eliminated.
Inventors:
LIN SZU-MIN
AGAMOHAMADI MITCH
AGAMOHAMADI MITCH
Application Number:
JP2001305619A
Publication Date:
September 10, 2002
Filing Date:
October 01, 2001
Export Citation:
Assignee:
ETHICON INC
International Classes:
B08B3/02; A61L2/02; A61L2/18; A61L2/20; A61L2/22; B08B3/04; B08B9/02; (IPC1-7): A61L2/18; A61L2/02; A61L2/20; B08B3/04; B08B9/02
Attorney, Agent or Firm:
Hiroaki Tazawa (1 person outside)