Title:
Apparatus and method for film deposition
Document Type and Number:
Japanese Patent JP5935045
Kind Code:
B2
Abstract:
A deposition apparatus comprises a vacuum chamber; a substrate holder; a target; and an angle correcting plate provided so as to cover an upper space of the principal surface of the substrate, and provided outside a spatial region encompassed by line segments connecting a periphery of the principal surface of the target and a periphery of the principal surface of the substrate, wherein when an arbitrary point on the principal surface of the substrate is denoted by B and at least a center point on the principal surface of the target is denoted by C, a part of the principal surface of the angle correcting plate exists on each line which forms 45° from the respective point B with respect to each line which connects the respective point B and the point C, and another part of the principal surface of the angle correcting plate extends to a side opposite to the target.
Inventors:
Masahiro Yamamoto
Application Number:
JP2013507089A
Publication Date:
June 15, 2016
Filing Date:
February 15, 2012
Export Citation:
Assignee:
Panasonic IP Management Co., Ltd.
International Classes:
C23C14/56; C23C14/24; C23C14/34; H01L21/285
Domestic Patent References:
| JP2009179856A | 2009-08-13 | |||
| JPH0853763A | 1996-02-27 | |||
| JP2009150000A | 2009-07-09 | |||
| JP2009179856A | 2009-08-13 | |||
| JPH0853763A | 1996-02-27 |
Foreign References:
| US20080076269A1 | 2008-03-27 | |||
| US20080076269A1 | 2008-03-27 |
Attorney, Agent or Firm:
Shin Osaka International Patent Office