Title:
Apparatus and method for film deposition
Document Type and Number:
Japanese Patent JP6038618
Kind Code:
B2
Abstract:
A film-forming apparatus 100 supplies a plurality of gases toward a substrate 101 in a chamber 103 using a shower plate 124. The shower plate 124 has a plurality of gas flow paths 121 extending within the shower plate along a first face of the substrate 101 side and connected to gas pipes 131 supplying a plurality of gases, and a plurality of gas jetting holes 129 bored such that the plurality of gas flow paths 121 and the chamber 103 communicate with each other on the first face side. In the film-forming apparatus 100, the plurality of gases supplied from the gas pipes 131 to the plurality of gas flow paths 121 of the shower plate 124 are supplied from the gas jetting holes 129 to the substrate 101 without being mixed inside of and vicinity of the shower plate 124.
Inventors:
Hideki Ito
Kunihiko Suzuki
Yusuke Sato
Shuichi Tsuchida
Isao Kamada
Masahiko Ito
Masami Naito
Hiroaki Fujibayashi
Ayumu Adachi
Koichi Nishikawa
Kunihiko Suzuki
Yusuke Sato
Shuichi Tsuchida
Isao Kamada
Masahiko Ito
Masami Naito
Hiroaki Fujibayashi
Ayumu Adachi
Koichi Nishikawa
Application Number:
JP2012265217A
Publication Date:
December 07, 2016
Filing Date:
December 04, 2012
Export Citation:
Assignee:
株式会社ニューフレアテクノロジー
一般財団法人電力中央研究所
株式会社デンソー
トヨタ自動車株式会社
株式会社豊田中央研究所
一般財団法人電力中央研究所
株式会社デンソー
トヨタ自動車株式会社
株式会社豊田中央研究所
International Classes:
H01L21/205; C23C16/455
Domestic Patent References:
| JP2008508744A | ||||
| JP2011101064A | ||||
| JP2010126810A | ||||
| JP5152208A | ||||
| JP2011105564A | ||||
| JP2006526900A | ||||
| JP2010062383A | ||||
| JP2000212752A | ||||
| JP2011109141A | ||||
| JP2011155308A | ||||
| JP2011146745A | ||||
| JP2170534A | ||||
| JP4058530A | ||||
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Foreign References:
| WO2011024995A1 |
Attorney, Agent or Firm:
Takeshi Sekine
Takayuki Shigeno
Atsuko Oaku
Hajime Yamashita
Takayuki Shigeno
Atsuko Oaku
Hajime Yamashita