Title:
APPARATUS AND METHOD FOR MANUFACTURING FUNCTIONAL FILM
Document Type and Number:
Japanese Patent JP2015148004
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an apparatus and method for manufacturing a functional film having a small variation of functionality even in a high temperature and a high humidity.SOLUTION: The apparatus for manufacturing a functional film, capable of forming an inorganic film as a functional layer under a pressure of the atmospheric pressure or less on a base film by an atomic layer deposition method comprises: a raw material supply part for supplying a raw material for the inorganic film on the base film; and a modification processing unit for appling AC voltages of a first frequency and second frequency having different frequencies to at least one or more kinds of gas for modification, respectively, to generate plasma and modifying the raw material on the base film by the plasma to form the inorganic film.
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Inventors:
TAJI KAZUKI
SAKKA KENJI
SAKKA KENJI
Application Number:
JP2014022976A
Publication Date:
August 20, 2015
Filing Date:
February 10, 2014
Export Citation:
Assignee:
KONICA MINOLTA INC
International Classes:
C23C16/503; C01B13/20; C01B13/28; C01G23/04; C23C16/40; H05H1/24
Attorney, Agent or Firm:
Gwangyang International Patent Office