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Title:
APPARATUS FOR POST-EXPOSURE BAKE
Document Type and Number:
Japanese Patent JP2022153352
Kind Code:
A
Abstract:
To provide a method and apparatus for performing immersion field guided post-exposure bake processes.SOLUTION: The apparatus includes a chamber body defining a processing space. Electrodes are disposed adjacently to the process space to generate an electric field. A process fluid is provided to the process space via a plurality of fluid conduits to facilitate immersion field guided post-exposure bake processes. A post-process chamber for rinsing, developing and drying a substrate is also provided.SELECTED DRAWING: Figure 1

Inventors:
Hanson, Kyle M.
Wilson, Gregory J.
Babayan, Viacheslav
Application Number:
JP2022093382A
Publication Date:
October 12, 2022
Filing Date:
June 09, 2022
Export Citation:
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Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/027; G03F7/38; H01L21/304
Domestic Patent References:
JP2000342957A2000-12-12
JP2014160819A2014-09-04
JP2004071855A2004-03-04
JP2003124088A2003-04-25
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation



 
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