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Title:
APPARATUS FOR PRODUCING SUBSTRATE
Document Type and Number:
Japanese Patent JP2010254495
Kind Code:
A
Abstract:

To provide an apparatus for producing a substrate, in which a crucible can be uniformly heated by decreasing a temperature gradient in the periphery of the crucible compared to a conventional method in the production of a gallium nitride substrate for producing a gallium nitride crystal on a seed substrate by supplying nitrogen gas to a melt containing gallium and sodium.

The apparatus (A) for producing a substrate is equipped with a first vessel (inner vessel) 12 having a heater 12a attached inside, and a crucible 14 housed inside the first vessel 12, and produces a crystal substrate on a seed substrate 20 to be immersed in a melt 30 in the crucible 14 by heating the crucible 14 with the heater 12a of the first vessel 12. The apparatus is also equipped with a heat insulating vessel 13 that is housed inside the first vessel 12 and houses the crucible 14.


Inventors:
HASEGAWA KOZO
Application Number:
JP2009104282A
Publication Date:
November 11, 2010
Filing Date:
April 22, 2009
Export Citation:
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Assignee:
IHI CORP
International Classes:
C30B9/00; C01B21/06; C30B29/38; H01L21/208
Domestic Patent References:
JP2003012400A2003-01-15
JP2004256897A2004-09-16
JP2007277058A2007-10-25
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe