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Title:
APPARATUS FOR REMOVING IMPURITY IN GAS
Document Type and Number:
Japanese Patent JP3698559
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide an apparatus for removing impurities in gas which controls quality of water by controlling always pH value of an absorbing liq. for absorbing soluble gas in air to be treated within a specified range without elevating concn. of gas components to be removed in a treated feeding air.
SOLUTION: In an apparatus for removing impurities in gas for absorbing and removing soluble impurities in air to be treated by a gas-liq. contacting method, pH value of an absorbing liq. in an absorbing liq. circulation system 13 wherein the absorbing liq. is fed into a flow path 11 for air to be treated and gas-liq. contact of the absorbing liq. with the air to be treated is performed to dissolve soluble gas in the air to be treated into the absorbing liq. and the absorbing liq. in which the soluble gas is dissolved is recovered and it is fed again into the flow path 11 for the air to be treated, is detected and based on the detected pH value ions of the absorbing liq. are selectively adjusted directly or indirectly by means of an ion selecting and removing apparatus 21 to control the pH value of the absorbing liq. within a specified range.


Inventors:
Hitoshi Inaba
Application Number:
JP25252798A
Publication Date:
September 21, 2005
Filing Date:
September 07, 1998
Export Citation:
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Assignee:
Takasago Thermal Engineering Co., Ltd.
International Classes:
B01D53/14; B01D47/06; B01D53/18; B01D53/34; B01D53/77; B01D53/78; (IPC1-7): B01D53/14; B01D47/06; B01D53/18
Domestic Patent References:
JP2057133U
JP11226096A
JP78738A
JP4722384A
JP1071318A
Attorney, Agent or Firm:
Tsutomu Toyama
Hidemi Matsukura
Yutaka Nagata
Yoshiyuki Kawaguchi