Title:
APPARATUS FOR REMOVING ORGANIC SILICON
Document Type and Number:
Japanese Patent JP3945246
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To sufficiently remove an organic silicon contained in an waste gas or the like from a plant, and to restrain an increase in cost required for removing the organic silicon.
SOLUTION: A plasma generating section (11) for generating low temperature plasma by electric discharge in a flow passage of a gas and a filter (12) arranged at the downstream side of the plasma generating section (11) are provided. The organic silicon is converted into silica particles by the action of the low temperature plasma and the silica particles are collected by a filter. Thereby, the organic silicon contained in the waste gas or the like from the plant is easily and surely removed.
Inventors:
Mogi Kanji
Toshio Tanaka
Kenkichi Kagawa
Toshio Tanaka
Kenkichi Kagawa
Application Number:
JP2001389469A
Publication Date:
July 18, 2007
Filing Date:
December 21, 2001
Export Citation:
Assignee:
Daikin Industries, Ltd.
International Classes:
B01D53/72; B01D51/00; B01D53/34; B01J19/08; (IPC1-7): B01D53/72; B01D51/00; B01D53/34; B01J19/08
Domestic Patent References:
| JP9141035A | ||||
| JP7155640A | ||||
| JP3267113A | ||||
| JP2000325745A | ||||
| JP63168044U | ||||
| JP54085480A |
Attorney, Agent or Firm:
Hiroshi Maeda
Hiroshi Koyama
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Teshima Masaru
Atsushi Fujita
Hiroshi Koyama
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Teshima Masaru
Atsushi Fujita