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Title:
APPARATUS FOR TREATING SUBSTRATE
Document Type and Number:
Japanese Patent JP2011067782
Kind Code:
A
Abstract:

To provide an apparatus for treating a substrate capable of supplying a treating liquid effectively throughout the surface of the substrate without consuming a great amount of the treating liquid.

Liquid-luring members 71 are arranged along the direction of conveying a glass substrate 100 in the vicinity of the end edges of the glass substrate 100 on both sides in the conveying direction of the glass substrate 100 which is conveyed by conveying rollers 9. The distance D between the end edge of the glass substrate 100 which is conveyed by the conveying rollers 9 and the liquid-luring member 71 is not greater than 2 mm. Furthermore, the height position of the top surface of the liquid-luring member 71 is higher than a height position of the top surface of the glass substrate 100 by H. This H value is favorably not less than a film thickness of the treating liquid supplied onto the surface of the glass substrate 100 from a nozzle 2 for delivering the treating liquid.


Inventors:
KAWAKAMI TAKUTO
JODAI KAZUO
YAMASHITA EIJI
Application Number:
JP2009222054A
Publication Date:
April 07, 2011
Filing Date:
September 28, 2009
Export Citation:
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Assignee:
DAINIPPON SCREEN MFG
International Classes:
B08B3/02; B65G49/06; G02F1/13; G02F1/1333; H01L21/304; H01L21/306; H01L21/677
Attorney, Agent or Firm:
Takashi Otsubo