Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
APPLIED PLASMA DUCT SYSTEM
Document Type and Number:
Japanese Patent JP2003234199
Kind Code:
A
Abstract:

To provide an applied plasma duct system for plasma treatment which efficiently exhausts gas in a broad pressure range.

A plasma vacuum pump comprises an array of permanent magnets, one or more plasma conduit or duct, a means for accelerating plasma ions through these conduits, and a support structure which constitutes at least one applied plasma duct system (APDS) cell. The APDS cell makes a lot of particles and plasma flow in the suitable direction at high speed, while restraining neutral particles from flowing in reversed direction.


More Like This:
JP3742866Multi-pole magnetic field forming device for multi-electrode discharge device
JP2019077951MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
JP5341206Plasma processing equipment
Inventors:
DANDL RAPHAEL A
QUON BILL H
ANTLEY SAMUEL
MITROVIC ANDREJ
JOHNSON WAYNE L
Application Number:
JP2002318321A
Publication Date:
August 22, 2003
Filing Date:
October 31, 2002
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO ELECTRON LTD
International Classes:
H05H1/46; B01J3/00; B01J19/08; H01J37/32; H01L21/205; H05H1/54; (IPC1-7): H05H1/46; B01J3/00; B01J19/08; H01L21/205
Attorney, Agent or Firm:
Takehiko Suzue (3 outside)



 
Previous Patent: LIGHTING DEVICE, AND ILLUMINATION DEVICE USING THE SAME

Next Patent: PLASMA IMPEDANCE ADJUSTMENT DEVICE