Title:
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME AND PRODUCTION OF PLATING RESIST
Document Type and Number:
Japanese Patent JP3195428
Kind Code:
B2
Abstract:
PURPOSE: To improve resolution, alkali developing property, plating resistance and low contamination property of a plating liquid by incorporating a specified unsatd. polymer compd., photopolymerizable unsatd. compd., and photoinitiator.
CONSTITUTION: This compsn. consists of an unsatd. polymer compd., photopolymerizable unsatd. compd. having at least two ethylene groups at the molecular end, and photoinitiator which produces free radicals by irradiation of active rays. The unsatd. polymer compd. is obtained by allowing the polymer compd. prepared by copolymerizing 10-90 pts.wt. of vinyl monomers (a) shown by the formula I and 10-90 pts.wt. of maleic acid anhydride (b), with total 100 pts.wt. of (a) and (b), to react with a compd. expressed by formula II in the equiv. ratio range of 0.1-1.2 hydroxyl group/acid anhydride. In formulae I and II, R1 is hydrogen atom or methyl group, R2-R4 are hydrogen atoms, alkyl group of C number 1 to 4, halogen atoms, hydroxyl groups, amino groups, or carboxyl groups, and R5 and R6 are hydrogen atoms or methyl groups.
Inventors:
Shinji Tsuchikawa
Toshiaki Ishimaru
Fumihiko Ohta
Go Nojiri
Toshiaki Ishimaru
Fumihiko Ohta
Go Nojiri
Application Number:
JP18805392A
Publication Date:
August 06, 2001
Filing Date:
July 15, 1992
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
G03F7/027; G03F7/033; G03F7/038; H05K3/18; (IPC1-7): G03F7/033; G03F7/027; G03F7/038; H05K3/18
Domestic Patent References:
| JP247657A | ||||
| JP6311930A | ||||
| JP4732815A |
Attorney, Agent or Firm:
Hajime Tsukuni (3 outside)