Title:
常圧乾燥装置及び基板処理装置及び基板処理方法
Document Type and Number:
Japanese Patent JP4542577
Kind Code:
B2
Abstract:
The substrate where the resist liquid is coated with the resist coating unit in the next of the upstream side is possessed on the roller transportation path, and enters in the housing of normal pressure drying unit (VD) by the roller transportation. The substrate that moves on the roller transportation path in the housing is put more greatly than the atmosphere of the normal temperature in the heating atmosphere of the high temperature (60 DEG C for instance). As a result, the thermal energy of the heating atmosphere enters directly into the surface of the resist coating film on the substrate.
Inventors:
Fumihiko Ikeda
Hiro Nagata
Hiro Nagata
Application Number:
JP2007242149A
Publication Date:
September 15, 2010
Filing Date:
September 19, 2007
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; F26B3/30; F26B9/00; F26B15/00; F26B25/00; G03F7/26
Domestic Patent References:
| JP2007200994A | ||||
| JP6310416A | ||||
| JP2000106341A | ||||
| JP7283108A | ||||
| JP2006007029A | ||||
| JP2003133197A |
Attorney, Agent or Firm:
Filial piety Sasaki