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Title:
ATMOSPHERIC PRESSURE PLASMA TREATMENT EQUIPMENT, ATMOSPHERE PRESSURE PLASMA TREATMENT METHOD, BASE MATERIAL, OPTICAL FILM AND IMAGE DISPLAY ELEMENT
Document Type and Number:
Japanese Patent JP2003003268
Kind Code:
A
Abstract:

To provide atmospheric pressure plasma treatment equipment which suppresses electrode staining and is excellent in productivity.

This plasma treatment equipment places the base material between opposite electrodes under the atmosphere pressure or the pressure near the atmosphere pressure, allows gas containing reactive gas and inert gas to exist and impresses a high-frequency voltage thereto to generate a discharge plasma, thereby performing the surface treatment of the base material. One electrode of the electrode described above is so arranged as to come into contact with the base material and the high-frequency voltage is so impressed and regulated that the time until the other electrode attains the same polarity as the ion polarity in the discharge plasma is longer than the time until the electrode attains the polarity different from the ion polarity shown in the discharge plasma.


Inventors:
FUKUDA KAZUHIRO
KONDO YOSHIKAZU
TODA YOSHIRO
OISHI KIYOSHI
TSUJI TOSHIO
Application Number:
JP2001184803A
Publication Date:
January 08, 2003
Filing Date:
June 19, 2001
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
H05H1/46; C23C16/509; (IPC1-7): C23C16/509; H05H1/46