PURPOSE: To stop the pump of an excess heat source after temperature control is completed, and putting the pump in operation only when necessary and to suppress a rise in liquid temperature by providing a sensor which operates the pump for a specific time after a body to be processed is passed to the automatic developing device equipped with a temperature control mechanism which holds the liquid temperature at a set value by the heating of a heater.
CONSTITUTION: A developer tank 11 is provided with a circulating device 16 which uniforms the temperature and concentration of a developer 15, and the circulating device 16 is provided with the circulating pump 19 between the suction port 17 at the bottom part of the developer tank 11 and the discharge port 18 at the upper part of the tank 11 and circulates and stirs the developer 15 through the operation of the pump 19. Further, the heater 20 which heats the developer 15 to the set temperature and the sensor 21 which detects the liquid temperature are provided in the developer tank 11. When the developer temperature is lower than the set temperature, the sensor 21 operates the pump 19 and heater 20 and when not, the pump 19 and heater 20 are stopped. Consequently, the temperature of the developer 15 attains to the set temperature, the circulating pump 19 does not operate, so a rise in liquid temperature due to the Joule heat of the circulating pump 19 is suppressed.
UCHIDA MAKOTO
ISOGAWA WATARU
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