BASE MATERIAL FOR ENDOSSEOUS IMPLANT MATERIAL, ENDOSSEOUS IMPLANT MATERIAL AND METHOD FOR PRODUCING BASE MATERIAL FOR ENDOSSEOUS IMPLANT MATERIAL

Title:

BASE MATERIAL FOR ENDOSSEOUS IMPLANT MATERIAL, ENDOSSEOUS IMPLANT MATERIAL AND METHOD FOR PRODUCING BASE MATERIAL FOR ENDOSSEOUS IMPLANT MATERIAL

Document Type and Number:

Japanese Patent JP2021109010

Kind Code:

A

Abstract:

To provide a base material for an endosseous implant material which can enhance adhesive strength of a bone material such as hydroxyapatite formed on a surface of a metal base material, an endosseous implant material having the same, and a method for producing the base material for the endosseous implant material.SOLUTION: A base material 10 for an endosseous implant material includes a metal base material 11, and a fine crystal layer 12. The metal base material 11 contains titanium or a titanium alloy. The fine crystal layer 12 is provided on at least a part of a surface of the metal base material 11, and contains a fine crystal of titanium or a titanium alloy. In the base material 10 for the endosseous implant material, a crystallite size of the fine crystal layer 12 is 4.0×10-5 mm or less.SELECTED DRAWING: Figure 4

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Inventors:

HAYASHI KISA
MIYAMOTO ERINA
IGARASHI KENTA
YAMAGUCHI SHOGO

Application Number:

JP2020003635A

Publication Date:

August 02, 2021

Filing Date:

January 14, 2020

Export Citation:

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Assignee:

NGK SPARK PLUG CO

International Classes:

A61L27/06; A61L27/12; A61L27/32; A61L27/42; A61L27/50

Attorney, Agent or Firm:

Seiko Ito
Hiroharu Kitahara
Satoshi Yamauchi
Ken Nakanishi

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