Title:
PHASE SHIFT MASK
Document Type and Number:
Japanese Patent JP3225535
Kind Code:
B2
Abstract:
PURPOSE: To provide the phase shift mask which can effectively utilize the advantages of a phase shift technology for both of isolated patterns and island- shaped patterns.
CONSTITUTION: Second apertures 22a,... provided adjacently to the first aperture 22 on a transparent substrate 1 provided with light shielding parts are so constituted as to have phase shift parts 21a,... having specific light transmittance, by which the resolution of the isolated patterns is improved. The peripheral parts in the light shielding parts of the apertures on the transparent substrate are provided with the phase shift parts having the specific light transmittance or the light shielding parts are formed of the phase shift parts having the specific light transmittance, by which the advantages of the phase shift technique are effectively exhibited for the island-shaped patterns as well.
Inventors:
Hideo Shimizu
Masayoshi Sasaki
Masayoshi Sasaki
Application Number:
JP12536591A
Publication Date:
November 05, 2001
Filing Date:
April 26, 1991
Export Citation:
Assignee:
ソニー株式会社
International Classes:
G03F1/29; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP344638A | ||||
| JP4223464A | ||||
| JP425841A | ||||
| JP412354A |
Other References:
【文献】米国特許4890309(US,A)
Attorney, Agent or Firm:
Toru Takatsuki