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Title:
BIS-O-AMINO(THIO)PHENOL ACID AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH11158129
Kind Code:
A
Abstract:

To obtain the subject new compound suitable for producing polymers satisfying the increasing demands of microelectronics.

An o-aminophenol carboxylic acid and an o-aminothiophenol carboxylic acid of formula I {A1-A7 are each H, CH3, OCH3, CH2CH3, OCH2CH3; T is O or S; (m) is 0 or 1; Z is a group of formula II [Q is C-A or N (A is H, F or the like)] or the like}. For example, a compound of formula III. The compound of formula I is obtained, for example, by allowing a nitro compound of formula IV (X is a halogen) and a nitro compound of formula V to react with an alkali metal hydroxide in a solvent at -10 to 80°C, and subsequently reducing the produced bis-o-nitro(thio)phenol into the bis-o-amino(thio)phenol.


Inventors:
SEZI RECAI
KEITMANN MICHAEL
Application Number:
JP27039298A
Publication Date:
June 15, 1999
Filing Date:
September 24, 1998
Export Citation:
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Assignee:
SIEMENS AG
International Classes:
C07D247/00; C07C201/12; C07C205/38; C07C213/02; C07C217/90; C07D239/52; C07D255/02; C07D257/12; C07D487/04; G03F7/023; (IPC1-7): C07C217/90; C07C201/12; C07C205/38; C07C213/02; C07D239/52; C07D247/00; C07D255/02; C07D257/12; C07D487/04
Attorney, Agent or Firm:
Iwao Yamaguchi