BLANKING APERTURE ARRAY SYSTEM, AND CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

Japanese Patent JP2023076259

A

To provide a blanking aperture array system which allows a path for transferring control data to be inspected in drawing without greatly preventing progress of drawing.SOLUTION: A blanking aperture array system includes a data output circuit that outputs first data and a first error detection code generated from the first data. A shift register transfers the first data and the first error detection code inputted from the data output circuit. A buffer receives the first data from a first register. An electrode receives a voltage based on the first data outputted from the buffer. An error detection circuit receives the first data and the first error detection code from the final-stage register, generates a second error detection code from the first data received from the final-stage register, and generates a detection signal indicating "matched" when the first error detection code from the final-stage register is accorded with the second error detection code and indicating "unmatched" when the first error detection code is not accorded with the second error detection code.SELECTED DRAWING: Figure 7

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HASEGAWA KEI
KIMURA HAYATO

JP2021189582A

June 01, 2023

November 22, 2021

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NUFLARE TECHNOLOGY INC

H01L21/027; G03F7/20; H01J37/147; H01J37/305

Patent Attorney Corporation Suzue Patent General Office
Masatoshi Kurata
Nobuhisa Nogawa
Tadashi Inoue
Takashi Mine
Naoki Kawano
Sanae Kaneko

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