Title:
基板処理装置
Document Type and Number:
Japanese Patent JP6649157
Kind Code:
B2
Abstract:
A substrate processing apparatus has an inner region surrounded by an outer wall, and the inner region is divided by a first partition wall into first and second substrate transfer regions. The substrate processing apparatus is provided with first and second substrate transfer robots which are arranged respectively at the first and second substrate transfer regions, a processing unit which is disposed adjacent to the second substrate transfer region, a control portion which controls motions of the first and second substrate transfer robots, a selective power supply turn-on means which selectively turns on the second substrate transfer robot while turning off the first substrate transfer robot, a controller which inputs into the control portion an adjustment signal for adjusting motions of the second substrate transfer robot, and an interlock means which individually detects the entry of a person into each of the first and second substrate transfer regions and turns off a substrate transfer robot at a corresponding region.
Inventors:
Tadashi Manabu
Muramoto
Muramoto
Application Number:
JP2016067178A
Publication Date:
February 19, 2020
Filing Date:
March 30, 2016
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/02; H01L21/677
Domestic Patent References:
| JP2005175184A | ||||
| JP2000323550A | ||||
| JP2001126976A |