Title:
パターニング用途のためのカーボンハードマスク及び関連方法
Document Type and Number:
Japanese Patent JP7407121
Kind Code:
B2
Abstract:
Embodiments herein provide methods of depositing an amorphous carbon layer using a plasma enhanced chemical vapor deposition (PECVD) process and hard masks formed therefrom. In one embodiment, a method of processing a substrate includes positioning a substrate on a substrate support, the substrate support disposed in a processing volume of a processing chamber, flowing a processing gas comprising a hydrocarbon gas and a diluent gas into the processing volume, maintaining the processing volume at a processing pressure less than about 100 mTorr, igniting and maintaining a deposition plasma of the processing gas by applying a first power to one of one or more power electrodes of the processing chamber, maintaining the substrate support at a processing temperature less than about 350° C., exposing a surface of the substrate to the deposition plasma, and depositing an amorphous carbon layer on the surface of the substrate.
Inventors:
Bencata Sabra Manian, Eswaranand
Yang, Yang
Manna, Pramit
Lamas Wormi, Curtic
Takehito Koshizawa
Malik, Abhigit Bus
Yang, Yang
Manna, Pramit
Lamas Wormi, Curtic
Takehito Koshizawa
Malik, Abhigit Bus
Application Number:
JP2020554282A
Publication Date:
December 28, 2023
Filing Date:
April 08, 2019
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/205; C23C16/26; C23C16/50; H01L21/3065
Domestic Patent References:
| JP11150115A | ||||
| JP7242493A | ||||
| JP2017504209A | ||||
| JP2012233259A | ||||
| JP2009505402A | ||||
| JP2010021282A |
Foreign References:
| WO2011146212A1 | ||||
| WO2018032684A1 | ||||
| WO2018034811A1 |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation
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