Title:
カルボキシ酸誘導体及びその製造方法
Document Type and Number:
Japanese Patent JP3608149
Kind Code:
B2
Abstract:
This invention relates to novel carboxylic acid derivatives represented by the following formula I and their synthesis: wherein, R1 is an hydrogen atom, an alkyl group or an alkoxy group of 1 to 20 carbon atoms in a linear, branched or cyclic form; R2 is a carboxy group of 1 to 40 carbon atoms in a linear, branched or cyclic form which is unsubstituted, or substituted into a hydroxy group, an ester group and an ether group. The novel carboxylic acid derivatives are more easily decomposed by acid than t-butyl ester compounds but are not dissolved in basic aqueous solution. According to this invention, carboxylic acid is under condensation with halogen compounds designed to prepare a larger monomolecular compound compared to the conventional method. Further, the condensed site is easily decomposed by acid but is extremely insoluble by basic aqueous solution. The carboxylic acid derivatives in a photoresist composition function not only as a dissolution promoter in the exposed area due to formation of the carboxylic aicd, thus enhancement of etching resistance and pattern profile in a resist.
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Inventors:
Theo Dongchul
Kim seoju
Park Joe Huon
Kim Jae Young
Kim seoju
Park Joe Huon
Kim Jae Young
Application Number:
JP29328899A
Publication Date:
January 05, 2005
Filing Date:
October 15, 1999
Export Citation:
Assignee:
Corea Kumho Petrochemical Company Limited
International Classes:
H01L21/31; C07C55/02; C07C67/10; C07C67/11; C07C69/00; C07C69/608; C07C69/75; C07C69/753; C07J9/00; G03F7/004; G03F7/039; (IPC1-7): C07C69/608; C07C67/10; C07C69/75; C07C69/753
Foreign References:
| US5532106 |
Other References:
Tetrahedron,1995年,Vol.51,No.2,p.5807-5812
Attorney, Agent or Firm:
Nakamura Kazutoshi