Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021035937
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern with good CD uniformity and a resist composition containing the carboxylate.SOLUTION: A carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition containing the same are provided. [In the formula, R4, R5 and R6 each represent a halogen atom, a fluorinated alkyl group or the like; m4 and m5 each represent an integer of 0 to 4 and m6 represents an integer of 0 to 5, provided that m4+m5+m6≥1 is satisfied and at least one of R4, R5 and R6 represents *-CO-R3; R3 represents an alkyl group (-CH2- contained in the group may be substituted with -O- or -CO-); and X0 represents an optionally substituted hydrocarbon group (-CH2- contained in the group may be substituted with -O-, -S-, -CO- or -SO2-).]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
YASUE TAKAHIRO
ICHIKAWA KOJI
YASUE TAKAHIRO
ICHIKAWA KOJI
Application Number:
JP2020140311A
Publication Date:
March 04, 2021
Filing Date:
August 21, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D333/76; C07C62/24; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation