Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021175725
Kind Code:
A
Abstract:
To provide carboxylate, a carboxylic acid generator including the carboxylate and a resist composition including the generator from which a resist pattern having an excellent pattern collapse margin (PCM) can be produced.SOLUTION: Provided is carboxylate expressed by and synthesized as in a formula (I-2), for instance.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
NAKAMURA HIROMU
ICHIKAWA KOJI
NAKAMURA HIROMU
ICHIKAWA KOJI
Application Number:
JP2021047858A
Publication Date:
November 04, 2021
Filing Date:
March 22, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C62/24; C07C65/10; C07C381/12; C07D321/10; C08F8/00; C08F222/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation