Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021183598
Kind Code:
A
Abstract:
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having a good mask error factor.SOLUTION: A carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition are provided. [In the formula, R1 and R2 each represent -O-L1-CO-O-R10 or the like; L1 represents an alkanediyl group; R4, R5, R7 and R8 each represent a halogen atom, a hydrocarbon group or the like, provided that the group may have a substituent and -CH2- in the group may be substituted with -O-, -CO- or the like; R10 represents an alicyclic hydrocarbon group having at least one or more -OR11 groups; R11 represents a hydrogen atom or an acid-labile group; X1 and X2 each represent O or S; m1 represents an integer of 1-5, m2 and m8 each represent an integer of 0-5, and m4, m5 and m7 each represent an integer of 0-4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; and X0 represents an optionally substituted hydrocarbon group.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
OGUMA JUN
ICHIKAWA KOJI
OGUMA JUN
ICHIKAWA KOJI
Application Number:
JP2021081314A
Publication Date:
December 02, 2021
Filing Date:
May 12, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/736; C07C62/24; C07C65/10; C07C69/757; C07C69/96; C07D321/06; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation