CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Japanese Patent JP2022091720

A

To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.SOLUTION: The carboxylate represented by formula (I), the carboxylic acid generator, and the resist composition containing the same are provided. [In the formula, X2 represents -O- or -S-; when X2 is -O-, L1 represents a single bond or an optionally substituted hydrocarbon group; when X2 is -S-, L1 represents an optionally substituted hydrocarbon group; R1 represents a halogen atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group, provided that -CH2- contained in the haloalkyl group and the alkyl group may be substituted with -O- or -CO-; m1 represents an integer of 1-6; m2 represents an integer of 0-2; and Z+ represents an organic cation.]SELECTED DRAWING: None

JPH0613495	[Title of the Invention] A novel electron acceptor and a charge transfer complex containing the novel electron acceptor.
JPS5325555	PREPARATION OF 2 AROMATIC OO*AMINOALKYL** OXIME
JP2559483	INDUSTRIAL APPLICABILITY [Title of Invention] Liquid phase isomerization of iodinated aromatic compounds

KOMURO KATSUHIRO
NAKAGAWA TAKUYA
ICHIKAWA KOJI

JP2021197986A

June 21, 2022

December 06, 2021

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SUMITOMO CHEMICAL CO

C07D307/56; C07C381/12; C07D307/68; C07D333/40; C07D407/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039

Shinki Global IP Patent Corporation

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