Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022141598
Kind Code:
A
Abstract:
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.SOLUTION: There are provided a carboxylate represented by a formula (I), a carboxylic acid generator, and a resist composition. [In the formula, L1 represents a single bond or an optionally substituted hydrocarbon group; R10 represents a group represented by a formula (R10-1) or a formula (R10-2); when L1 is a single bond, R10 is a group represented by a formula (R10-1); Z+ represents an organic cation; ring W represents an alicyclic hydrocarbon group; each R1 independently represents a halogen atom, a hydroxy group, a haloalkyl group, an alkyl group, an alicyclic hydrocarbon group or a group composed of a combination thereof; m1 represents an integer of 0-6; m2 represents an integer of 1-6; and * represents a binding site to L1.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2022036046A
Publication Date:
September 29, 2022
Filing Date:
March 09, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C59/125; C07C61/15; C07C69/80; C07C381/12; C07D319/08; C07D333/76; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation