Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022183075
Kind Code:
A
Abstract:
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.SOLUTION: There are provided a carboxylate represented by a formula (I), a carboxylic acid generator, and a resist composition. [In the formula, R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group and A1 and A2 each represent a hydrocarbon group, provided that the hydrocarbon groups may have a substituent and -CH2- contained in the hydrocarbon groups may be substituted with -O-, -CO-, -S- or -SO2-; m1 represents an integer of 1-5, m2, m4, m5 and m8 represent integers of 0-5, and m7 represents an integer of 0-4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; and X0 represents an optionally substituted hydrocarbon group, provided that -CH2- contained in the group may be substituted with -O- or the like.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2022084704A
Publication Date:
December 08, 2022
Filing Date:
May 24, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C43/225; C07C62/24; C07C69/94; C07D321/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation