CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023010679

Kind Code:

A

Abstract:

To provide a carboxylate that can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.SOLUTION: The present invention provides a carboxylate represented by the formula (I), a carboxylic acid generator and a resist composition [where R1-R3 each denote *-O-CO-O-R10, *-O-L10-CO-O-R10 or the like. L10 is an alkanediyl group. R10 is a group having -SO2-. R4-R9 each denote a halogen atom, a haloalkyl group or the like. A1-A3 each denote an optionally substituted hydrocarbon group].SELECTED DRAWING: None

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Inventors:

SHIMADA MASAHIKO
ICHIKAWA KOJI

Application Number:

JP2022110033A

Publication Date:

January 20, 2023

Filing Date:

July 07, 2022

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07C62/06; C07C62/24; C07D321/10; C07D411/12; C09K3/00; G03F7/038; G03F7/039

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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