CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023014039

Kind Code:

A

Abstract:

To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent CD uniformity, and a resist composition comprising the same.SOLUTION: The present invention provides a carboxylate represented by the formula (I), a carboxylic acid generator and a resist composition. (R1-R3: OL10COOR10 or the like (L10: alkanediyl, R10: oxirane or oxetane derivative). R4-R9: halogen or the like. A1-A3: substituted/unsubstituted hydrocarbon. X4: single bond, CH2 or the like. X0: substituted/unsubstituted hydrocarbon).SELECTED DRAWING: None

More Like This:

JP4291576	Antagonists of MCP-1 function and how to use them
JPH07121239	[Title of Invention] Method for determining DNA base sequence
WO/2007/063013	2,4,5-TRIPHENYL IMIDAZOLINE DERIVATIVES AS INHIBITORS OF THE INTERACTION BETWEEN P53 AND MDM2 PROTEINS FOR USE AS ANTICANCER AGENTS

Inventors:

SHIMADA MASAHIKO
ICHIKAWA KOJI

Application Number:

JP2022112442A

Publication Date:

January 26, 2023

Filing Date:

July 13, 2022

Export Citation:

Click for automatic bibliography generation Help

Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D407/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

Previous Patent: Salt, acid generator, resist composition and method for producing resist pattern

Next Patent: winding machine