Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023014043
Kind Code:
A
Abstract:
To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.SOLUTION: The present invention provides a carboxylate represented by the formula (I), a carboxylic acid generator and a resist composition. (R1, R2: OL10COOR10 or the like (L10: alkanediyl. R10: formula (IC)). R4, R5, R7, R8: halogen, haloalkyl. A1, A2: substituted/unsubstituted hydrocarbon. m1: 1-5. m2, m8: 0-5. m4, m5, m7: 0-4. RA: saturated hydrocarbon. L12: single bond, substituted/unsubstituted hydrocarbon. X0: substituted/unsubstituted hydrocarbon).SELECTED DRAWING: None
Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2022112488A
Publication Date:
January 26, 2023
Filing Date:
July 13, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D305/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation