Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023156256
Kind Code:
A
Abstract:
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced.SOLUTION: There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition containing the same. [In the formula, R1 and R2 each represent a hydrogen atom, a halogen atom or the like; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1 and A2 each represent an optionally substituted hydrocarbon group, provided that -CH2- in the group may be substituted with -O-, -CO- or the like; W1 and W2 each represent an alicyclic hydrocarbon group, provided that -CH2- in the group may be substituted with -O-, -CO- or the like; m1 represents an integer of 1-5; m2 and m8 represent integers of 0-5; m4 and m5 represent integers of 0-13; and m7 represents an integer of 0-4.]SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
HOMMA HARUKA
ICHIKAWA KOJI
HOMMA HARUKA
ICHIKAWA KOJI
Application Number:
JP2023064357A
Publication Date:
October 24, 2023
Filing Date:
April 11, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C43/225; C07C43/247; C07C62/24; C07C69/712; C07C69/75; C07C69/753; C07D321/10; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP