Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023177297
Kind Code:
A
Abstract:
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good mask error factor to be produced.SOLUTION: There are provided: a carboxylate represented by formula (I) and the like; and a resist composition. [In the formula, Ar1-Ar3 each represent naphthalene, anthracene or the like; R1-R3 each represent -O-R10, -O-CO-R10 or the like; R10 represents a base-labile group; R4-R9 each represent a halogen atom, a haloalkyl group or the like; and A1-A3 each represent a substituted/unsubstituted hydrocarbon group.]SELECTED DRAWING: None
Inventors:
NAKAMURA HIROMU
NOZU SHUNTA
ICHIKAWA KOJI
NOZU SHUNTA
ICHIKAWA KOJI
Application Number:
JP2023086976A
Publication Date:
December 13, 2023
Filing Date:
May 26, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C62/24; C07D321/10; C07D333/76; C08F20/10; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP