Title:
CARBOXYLATE, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022077505
Kind Code:
A
Abstract:
To provide a carboxylate and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.SOLUTION: The carboxylate represented by formula (I) and the resist composition are provided. [In the formula, Ar represents an optionally substituted C6-18 aromatic hydrocarbon group; X1 represents an oxygen atom or a sulfur atom; R1 represents a halogen atom or a C1-12 haloalkyl group; R2 represents a halogen atom, a hydroxy group, a C1-12 haloalkyl group or a C1-12 alkyl group, provided that -CH2- contained in the haloalkyl group and the alkyl group may be substituted with -O- or -CO-; m1 represents an integer of 1-6; m2 represents an integer of 0-4; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2021179478A
Publication Date:
May 23, 2022
Filing Date:
November 02, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C65/24; C07C381/12; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation