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Patent Searching and Data


Title:
CHAMBER APPARATUS FOR GASEOUS DISPLACEMENT, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT
Document Type and Number:
Japanese Patent JP2012158508
Kind Code:
A
Abstract:

To provide a chamber apparatus for gaseous displacement which supplies a gas into a chamber in a short time while suppressing raising of dust with a simple structure, and to provide a method for manufacturing an optical element.

The chamber apparatus for gaseous displacement includes: a chamber 11 whose inside is decompressed by a decompression device, and into which a gas is supplied by a gas supply apparatus; a shielding part 12 which shields and diffuses the gas A1, supplied to the chamber 11, in the chamber 11; and rectification parts 13 and 14 which rectify A3 and A4 the gas A2 diffused by the shielding part 12.


Inventors:
UMEDA DAISUKE
Application Number:
JP2011021115A
Publication Date:
August 23, 2012
Filing Date:
February 02, 2011
Export Citation:
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Assignee:
OLYMPUS CORP
International Classes:
C03B11/00; C03B11/08; G02B3/00
Attorney, Agent or Firm:
Yoshiyuki Osuga