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Title:
Charged particle beam device
Document Type and Number:
Japanese Patent JP6002470
Kind Code:
B2
Abstract:
An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.

Inventors:
Hiroshi Makino
Hideyuki Kazumi
Yamazaki Minoru
Suwon
Miki Izawa
Application Number:
JP2012144901A
Publication Date:
October 05, 2016
Filing Date:
June 28, 2012
Export Citation:
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Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/147; H01J37/05; H01J37/153; H01J37/244; H01J37/29
Domestic Patent References:
JP10302705A
JP2006332038A
JP2012003902A
JP2002367552A
JP2004342341A
JP2004134387A
JP2821153B2
JP3932894B2
JP2008243485A
Attorney, Agent or Firm:
Manabu Inoue
Yuji Toda
Shigemi Iwasaki