To provide a charged particle beam drawing apparatus capable of high-precision drawing on a sample by correcting misalignment of the axis of a charged particle beam due to a shift in position of a charged particle beam generation source, and enabling beam adjustment free of beam absence and beam defocusing.

The charged particle beam drawing apparatus is controlled to deflect a beam emitted by the charged particle beam generation source 1 by a 1st deflector 2 first to cross an optical axis, and then to deflect the charged particle beam deflected by the 1st deflector to travel on the optical axis by a 2nd deflector 3. At this time, excitation quantities of the 1st and 2nd deflectors are so adjusted that the beam pass the centers of two apertures 5 and 12 at separate downstream positions. Consequently, the adjustments are made without exerting adverse influence of a shift in position of the charged particle beam generation source 1 upon the downstream side.