Title:
CHARGED PARTICLE BEAM EXPOSING METHOD AND ITS DEVICE
Document Type and Number:
Japanese Patent JP3310448
Kind Code:
B2
Abstract:
PURPOSE: To make uniform the strength of charged particle beams emitted to a sample through each opening of BAA masks and draw patterns with excellent precision.
CONSTITUTION: A charged particle beam exposing method comprises: step S40 of turning on a plurality of openings of a BAA mask with the us$ a specific number as 1 unit; step S50 of detecting the strength of electron beams reaching a sample; and step S60 of calculating an offset voltage given when performing on-control of driving means of the opening in 1 unit in response to the strength of charged particle beams detected. The strength of charged particle beams reaching the sample through the plurality of openings of the BAA mask is substantially identical every 1 unit.
Inventors:
Yoshihisa Okyo
Takamasa Sato
Hiroshi Yasuda
Takamasa Sato
Hiroshi Yasuda
Application Number:
JP4752194A
Publication Date:
August 05, 2002
Filing Date:
March 17, 1994
Export Citation:
Assignee:
富士通株式会社
International Classes:
G21K5/04; H01L21/027; (IPC1-7): H01L21/027; G21K5/04
Domestic Patent References:
| JP1295419A | ||||
| JP458518A |
Attorney, Agent or Firm:
Tadahiko Ito
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