To solve a problem that, in a conventional charged particle beam apparatus for aiming at high-speed processing, life of a mask with an opening is getting shorter due to increase of a current value of a charged particle beam, and a throughput of the charged particle beam device is reduced due to a shortened mask exchange period; and to improve the throughput of the device by solving the problem of the mask life caused by increased current of an irradiating beam in the charged particle beam processing apparatus.
The charged particle beam apparatus applies an electrical potential between acceleration voltage of a charged particle source and earth electrical potential to the mask with an opening. The mask is arranged by being electrically isolated. Longer life of the mask can be attained since energy incident to the mask is reduced and a level of damage on the mask caused by a beam 2 is lessened. Consequently, a stable operation of the charged particle beam apparatus can be achieved since an exchange period of the mask having an opening becomes longer, and the charged particle beam apparatus having a high throughput can be provided.
UMEMURA KAORU
KANEOKA NORIYUKI
| JPH09186138A | 1997-07-15 | |||
| JPS535962A | 1978-01-19 |
Yuji Toda