Title:
CHARGED PARTICLE BEAM PROJECTION APPARATUS
Document Type and Number:
Japanese Patent JP3728829
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a charged particle beam projection apparatus by which a mask or the like set inside the apparatus can be inspected without being taken out to the outside.
SOLUTION: In an electron beam projection apparatus, an electron beam is irradiated, and a pattern which is formed on a mask 3 is transferred onto a wafer 6. In the electron beam projection apparatus, a microscope 10 which observes the mask 3 or the wafer 6 is installed inside a chamber VC in which the electron beam is irradiated, and the mask 3 or the wafer 6 is moved between the inspection position inside the observation visual field of the microscope 10 and a pattern projection position without opening the chamber VC.
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Inventors:
Shintaro Kawada
Application Number:
JP26976596A
Publication Date:
December 21, 2005
Filing Date:
October 11, 1996
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G03B27/42; G03B27/58; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP6224110A | ||||
| JP6188182A | ||||
| JP7263308A | ||||
| JP4151152A |
Attorney, Agent or Firm:
Fuyuki Nagai
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