To provide a charged particle beam transferring apparatus and a device manufacturing method using the same which is capable of shielding external magnetic fields, including stray magnetic fields induced by the movements of peripheral electric wires or conductors or linear motors, etc., for driving a mask stage or a sensitive substrate stage.

A magnetic shield 33 is attached to the downside of a vacuum wall 26 covering the downside of an electromagnetic lens 14, etc., at the wafer side, and the magnetic shield 33 is roughly grouped into an L-shaped part 33a with an L-shaped section and a conical part 33b continuing the L-shape part 33a. The conical part 33b is taken as a part of a cone to form the inner surface (surface at the optical axis 27 side) of the magnetic shield 33 like a truncated cone. The magnetic shield 33 is placed so that the downside of the magnetic shield 33 approaches to the optical path end 32 of a Z-sensor with a small clearance.