Title:
調整装置を有する荷電粒子複数ビームレット・リソグラフィ・システム
Document Type and Number:
Japanese Patent JP5844269
Kind Code:
B2
Abstract:
The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.
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Inventors:
Wieland, Marco Januyako
Jagel, Remco
Van Fern, Alexander Hendrik Vincent
Stanblink, Steen Willem Hermann Karel
Jagel, Remco
Van Fern, Alexander Hendrik Vincent
Stanblink, Steen Willem Hermann Karel
Application Number:
JP2012535797A
Publication Date:
January 13, 2016
Filing Date:
October 26, 2010
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
| JP2006210460A | ||||
| JP2007080903A |
Foreign References:
| WO2009127659A2 |
Attorney, Agent or Firm:
Kurata Masatoshi
Nobuhisa Nogawa
Takashi Mine
Nobuhisa Nogawa
Takashi Mine