Title:
CHARGED-PARTICLE SOURCE
Document Type and Number:
Japanese Patent JP2021174772
Kind Code:
A
Abstract:
To increase the operational time of a charged-particle source, etc.SOLUTION: A charged-particle source (100) for generating a charged particle comprises a sequence of electrodes including an emitter electrode (101) with an emitter surface (111), a counter electrode (103) held at an electrostatic voltage with respect to the emitter electrode (101) at a sign opposite to that of the charged particles, and one or more adjustment electrodes (104, 105, 106, 107) surrounding the source space (110) between the emitter electrode (101) and the counter electrode (103). These electrodes have a basic overall rotational symmetry along a central axis (cx), with the exception of one or more steering electrodes (104, 105, 106, 107) which is an electrode which interrupts the radial axial-symmetry of the electric potential of the source, for instance tilted or shifted to an eccentric position or orientation, configured to force unintended, secondary charged particles (sc) away from an emission surface (111).SELECTED DRAWING: Figure 1
Inventors:
STEFAN GERHOLD
RUPP WERNER
MATTIA CAPRIOTTI
CHRISTOPH SPENGLER
RUPP WERNER
MATTIA CAPRIOTTI
CHRISTOPH SPENGLER
Application Number:
JP2021069036A
Publication Date:
November 01, 2021
Filing Date:
April 15, 2021
Export Citation:
Assignee:
IMS NANOFABRICATION GMBH
International Classes:
H01J37/08; H01J27/26; H01J37/073
Attorney, Agent or Firm:
Kato Asamichi
Kiuchi Uchida
Kiuchi Uchida
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