Title:
CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2004139063
Kind Code:
A
Abstract:
To provide a resist composition having excellent transmittance of light of a wavelength below 170 nm.
The positive resist composition contains: at least one kind of acid generating agents selected from formulae (1), (IIa) and (IIb); and a resin which is made soluble in an aqueous alkaline solution by the effect of an acid. The chemical amplification type positive type resist composition exhibits high transmittance to a wavelength of 157 nm and excels in the balance of performances. Accordingly, the composition exhibits the performances excellent as a resist for an F2 laser.
Inventors:
TOISHI KOJI
KAMIYA YASUNORI
KAMIYA YASUNORI
Application Number:
JP2003331318A
Publication Date:
May 13, 2004
Filing Date:
September 24, 2003
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto
Toru Nakayama
Masayuki Enomoto