Title:
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2023177048
Kind Code:
A
Abstract:
To obtain a resist pattern with improved resolution and good LER and fidelity.SOLUTION: A chemically amplified negative resist composition contains: (A) an acid generator containing at least one selected from a sulfonium salt represented by the following formula (A1) and an iodonium salt represented by the following formula (A2); and (B) a base polymer containing a polymer containing a specific repeating unit.SELECTED DRAWING: None
Inventors:
MASUNAGA KEIICHI
FUKUSHIMA MASAHIRO
KOTAKE MASAAKI
WATANABE SATOSHI
FUKUSHIMA MASAHIRO
KOTAKE MASAAKI
WATANABE SATOSHI
Application Number:
JP2022089738A
Publication Date:
December 13, 2023
Filing Date:
June 01, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/004; C07C71/00; C07C309/31; C07C309/42; C07C381/12; C07D209/94; C07D279/20; C07D307/77; C07D327/04; C07D327/06; C07D327/08; C07D333/02; C07D333/52; C07D333/76; C07D335/02; C07D339/08; C07D491/18; C07D495/18; C08F12/24; C08F20/30; G03F7/038; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office