Title:
化学増幅ネガ型レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP6874738
Kind Code:
B2
Abstract:
A negative resist composition comprising an onium salt of arenesulfonic acid having a bridged ring-containing group and a base polymer is provided, the onium salt being capable of generating a bulky acid having an appropriate strength and controlled diffusion. When the resist composition is processed by lithography, a dot pattern of rectangular profile having high resolution and reduced LER is formed.
Inventors:
Masatake Kotake
Satoshi Watanabe
Keiichi Masunaga
Satoshi Watanabe
Keiichi Masunaga
Application Number:
JP2018100564A
Publication Date:
May 19, 2021
Filing Date:
May 25, 2018
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C08F212/14; G03F7/038; G03F7/09; G03F7/20
Domestic Patent References:
| JP2016065016A | ||||
| JP2016200805A | ||||
| JP2015232598A |
Attorney, Agent or Firm:
Hideaki International Patent Office