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Title:
CHEMICALLY-AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERNING METHOD
Document Type and Number:
Japanese Patent JP2015169790
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a chemically-amplified positive resist composition capable of providing a pattern having an extremely high resolution with low line edge roughness.SOLUTION: A chemically-amplified positive resist composition includes: (A) a salt represented by the formula (1); and (B) a resin containing a repeating unit represented by the following formula (U-1).

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Inventors:
DOMON DAISUKE
MASUNAGA KEIICHI
WATANABE SATOSHI
OHASHI MASAKI
FUKUSHIMA MASAHIRO
Application Number:
JP2014044510A
Publication Date:
September 28, 2015
Filing Date:
March 07, 2014
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/004; C07D327/08; C07D333/76; C08F12/24; C08F20/30; C09K3/00; G03F7/039
Domestic Patent References:
JP2011197464A2011-10-06
JP2009244805A2009-10-22
JP2011173855A2011-09-08
JP2013125146A2013-06-24
JP2013020226A2013-01-31
JPH09127700A1997-05-16
JP2015054833A2015-03-23
JP2002131898A2002-05-09
Foreign References:
WO2012173282A12012-12-20
Attorney, Agent or Firm:
Mikio Yoshimiya



 
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