Title:
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2023177038
Kind Code:
A
Abstract:
To provide a chemically amplified positive resist composition containing an acid generator capable of generating an acid which has moderate acid strength and exhibits small diffusion.SOLUTION: The resist composition contains: an acid generator of (A1) or (A2); and a polymer which contains a repeating unit having a phenol skeleton and increases its solubility in an alkali developer by an acid.SELECTED DRAWING: None
Inventors:
MASUNAGA KEIICHI
FUKUSHIMA MASAHIRO
KOTAKE MASAAKI
WATANABE SATOSHI
FUKUSHIMA MASAHIRO
KOTAKE MASAAKI
WATANABE SATOSHI
Application Number:
JP2022089720A
Publication Date:
December 13, 2023
Filing Date:
June 01, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/004; G03F7/039; G03F7/09; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office
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