Title:
化学増幅型ポジ型レジスト組成物
Document Type and Number:
Japanese Patent JP4631229
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a chemical amplification positive resist composition suitable for the lithography by excimer laser such as ArF and KrF laser and having the characteristics with excellent performance balance of resolution and sensitivity. SOLUTION: The chemical amplification positive resist composition contains an acid producing agent and a resin which has a polymerization unit derived from a monomer expressed by formula (I) and which is insoluble or hardly soluble by itself with an alkali but is changed into alkali-soluble by the effect of an acid. In formula (I), n represents an integer from 0 to 4, each of R1 and R2 independently represents a hydrogen atom or a 1-4C alkyl group, each of R3 and R4 independently represents a 1-6C alkyl group which may be substituted with fluorine atoms, and R3 or R4 is a 1-6C alkyl group which is substituted with at least one fluorine atom.
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Inventors:
Kae Araki
Koji Kuwana
Yasunori Uetani
Koji Kuwana
Yasunori Uetani
Application Number:
JP2001234648A
Publication Date:
February 16, 2011
Filing Date:
August 02, 2001
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/039; C08F32/04; C08F222/14; C08F232/08; G03F7/004; H01L21/027
Domestic Patent References:
| JP2003089708A | ||||
| JP2002338634A | ||||
| JP2002229192A | ||||
| JP2002145962A | ||||
| JP2001302735A | ||||
| JP2001209181A | ||||
| JP2002072484A |
Attorney, Agent or Firm:
Toru Nakayama